The invention belongs to the field of plasma doping, and particularly relates to a plasma doping method of powder materials. A plasma doping method is characterized by comprising the steps as follows: an acceptor powder material is added to a plasma doping chamber; a donor gas is introduced into the plasma doping chamber; the acceptor powder material is in a stable fluidized state by controlling the flow of the donor gas; an excitation power supply is started to activate the donor gas and to form non-equilibrium plasma through dielectric barrier discharge; active particles in the non-equilibrium plasma enter the acceptor powder material to complete doping; and the acceptor powder material is activated under the action of an electric field and a magnetic field and the intrinsic property of the acceptor powder material is also strengthened. The method provided by the invention is simple in process, good in flexibility and high in doping efficiency; the powder material which is high in doping uniformity and rich in defect can be obtained under a mild condition; and the application prospect of the method is very wide.