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发明公开
CN109423602A 掩膜板及成膜方法 有权

掩膜板及成膜方法
摘要：
本发明提供一种掩膜板，其在通过磁铁阵列的吸引力将掩膜板紧密贴合在基板的下表面以使基板(Sw)夹隔在接触板(Tp)和掩膜板(MP)之间时，可尽量抑制在图案掩膜部(1)的透孔(11)周边的突起，并可防止已形成的薄膜上发生掩膜失效。本发明的掩膜板(MP)具有：图案掩膜部(1)，其由以规定的图案开设并贯通板厚度方向的多个透孔(11)构成；以及遮挡部(2)，其位于图案掩膜部的周围。至少在磁铁的并列设置方向上与图案掩膜部相邻的遮挡部的部分(21)形成为与图案掩膜部的磁导率相同。
摘要（英）：

A mask can suppress protrusions around the through hole (11) of the pattern mask portion (1) as much as possible, and can prevent mask failure from occurring on the formed film when the mask is tightly attached to the lower surface of the substrate by the attraction of the magnet array to sandwich the substrate (Sw) between the contact plate (Tp) and the mask (MP). The mask (MP) of the present invention has a pattern mask portion (1) composed of a plurality of through holes (11) opened in a predetermined pattern and penetrating the thickness direction of the sheet; and a shielding portion (2)located around the pattern mask portion. The portion (21) of the shielding portion adjacent to the pattern mask portion at least in the direction in which the magnets are arranged in parallel is formed to have the same magnetic permeability as that of the pattern mask portion.

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