发明公开
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 光刻设备和器件制造方法
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申请号： EP03257068.1申请日： 2003-11-10
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公开(公告)号： EP1429188A3公开(公告)日： 2004-10-13
- 发明人: Lof, Joeri , Bijlaart, Erik Theodorus Maria , Butler, Hans , Donders, Sjoerd Nicolaas Lambertus , Hoogendam, Christiaan Alexander , Kolesnychenko, Aleksey , Loopstra, Erik Roelof , Meijer, Hendricus Johannes Maria , Mertens, Jeroen Johannes Sophia Maria , Mulkens, Johannes Catharinus Hubertus , Ritsema, Roelof Aeilko Siebrand , Van Schaik, Frank , Sengers, Timotheus Franciscus , Simon, Klaus , De Smit, Joannes Theodoor , Straaijer, Alexander , Streefkerk, Bob , Van Santen, Helmar
- 申请人： ASML Netherlands B.V.
- 申请人地址： De Run 6501 5504 DR Veldhoven NL
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： De Run 6501 5504 DR Veldhoven NL
- 代理机构： Leeming, John Gerard
- 优先权： EP02257822 20021112; EP03253636 20030609
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A lithographic projection apparatus is disclosed in which the space between the final element of the projection system and the substrate is filled with a liquid. An edge seal member 17, 117 at least partly surrounds the substrate W or other object on the substrate table WT to prevent catastrophic liquid loss when edge portions of the substrate or are imaged or illuminated.
公开/授权文献
- EP1429188B1 Lithographic projection apparatus 公开/授权日：2013-06-19
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