发明公开
EP2954555A2 SMALL FORM FACTOR MAGNETIC SHIELD FOR MAGNETORESTRICTIVE RANDOM ACCESS MEMORY (MRAM)
有权
具有小的形状因子磁屏蔽FOR磁阻随机存取存储器(MRAM)
- 专利标题: SMALL FORM FACTOR MAGNETIC SHIELD FOR MAGNETORESTRICTIVE RANDOM ACCESS MEMORY (MRAM)
- 专利标题(中): 具有小的形状因子磁屏蔽FOR磁阻随机存取存储器(MRAM)
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申请号: EP14703762.6申请日: 2014-01-31
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公开(公告)号: EP2954555A2公开(公告)日: 2015-12-16
- 发明人: GU, Shiqun , ZHANG, Rongtian , RAMACHANDRAN, Vidhya , KIM, Dong Wook
- 申请人: Qualcomm Incorporated
- 申请人地址: 5775 Morehouse Drive San Diego, CA 92121-1714 US
- 专利权人: Qualcomm Incorporated
- 当前专利权人: Qualcomm Incorporated
- 当前专利权人地址: 5775 Morehouse Drive San Diego, CA 92121-1714 US
- 代理机构: Bentall, Mark James
- 优先权: US201361762428P 20130208; US201313777475 20130226
- 国际公布: WO2014123783 20140814
- 主分类号: H01L23/552
- IPC分类号: H01L23/552 ; H01L23/64 ; H01L43/02 ; H01L27/22
摘要:
Some implementations provide a die that includes a magnetoresistive random access memory (MRAM) cell array that includes several MRAM cells. The die also includes a first ferromagnetic layer positioned above the MRAM cell array, a second ferromagnetic layer positioned below the MRAM cell array, and several vias positioned around at least one MRAM cell. The via comprising a ferromagnetic material. In some implementations, the first ferromagnetic layer, the second ferromagnetic layer and the several vias define a magnetic shield for the MRAM cell array. The MRAM cell may include a magnetic tunnel junction (MTJ). In some implementations, the several vias traverse at least a metal layer and a dielectric layer of the die. In some implementations, the vias are through substrate vias. In some implementations, the ferromagnetic material has high permeability and high B saturation.
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