- Patent Title: Process for the nanostructuring of a block copolymer film using a nonstructured block copolymer based on styrene and on methyl methacrylate, and nanostructured block copolymer film
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Application No.: US15105245Application Date: 2014-12-15
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Publication No.: US10011675B2Publication Date: 2018-07-03
- Inventor: Christophe Navarro , Celia Nicolet , Xavier Chevalier
- Applicant: Arkema France
- Applicant Address: FR Colombes
- Assignee: Arkema France
- Current Assignee: Arkema France
- Current Assignee Address: FR Colombes
- Agency: RatnerPrestia
- Priority: FR1362735 20131217
- International Application: PCT/FR2014/053329 WO 20141215
- International Announcement: WO2015/092241 WO 20150625
- Main IPC: C08F297/02
- IPC: C08F297/02 ; B82Y30/00 ; C09D153/00 ; G03F7/00 ; B82Y40/00 ; C08J5/18
Abstract:
The invention relates to a block copolymer film nanostructured in nanodomains at a predetermined temperature, obtained from a basic block copolymer which is nonstructured at said predetermined temperature, and at least one block of which comprises styrene and at least another block of which comprises methyl methacrylate. The block copolymer film is useful for forming nano-lithography masks.
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