- 专利标题： Lithographic apparatus and method of manufacturing a lithographic apparatus
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申请号： US15314841申请日： 2015-05-07
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公开(公告)号： US10018926B2公开(公告)日： 2018-07-10
- 发明人: Rogier Hendrikus Magdalena Cortie , Christianus Wilhelmus Johannes Berendsen , Andre Bernardus Jeunink , Adrianus Hendrik Koevoets , Jim Vincent Overkamp , Siegfried Alexander Tromp , Van Vuong Vy , Daniel Elza Roeland Audenaerdt
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS, B.V.
- 当前专利权人： ASML NETHERLANDS, B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 优先权： EP14171800 20140610; EP15159551 20150318
- 国际申请： PCT/EP2015/060039 WO 20150507
- 国际公布： WO2015/188988 WO 20151217
- 主分类号： G03B27/32
- IPC分类号： G03B27/32 ; G03B27/52 ; H02K41/02 ; G03F7/20
摘要：
A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.
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