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公开(公告)号：US10705426B2
公开(公告)日：2020-07-07
申请号：US16097640
申请日：2017-04-05
发明人： Gijs Kramer , Martijn Houben , Nicholas Peter Waterson , Thibault Simon Mathieu Laurent , Yuri Johannes Gabriël Van De Vijver , Marcus Martinus Petrus Adrianus Vermeulen , Simon Karel Ravensbergen , Vincentius Fransiscus Cloosterman , Siegfried Alexander Tromp , Coen Hubertus Matheus Baltis , Justin Johannes Hermanus Gerritzen , Niek Jacobus Johannes Roset
IPC分类号： G03F7/20
摘要： An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
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公开(公告)号：US09785055B2
公开(公告)日：2017-10-10
申请号：US14399137
申请日：2013-05-07
发明人： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Wilhelmus Franciscus Johannes Simons , Martijn Houben , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Han Henricus Aldegonda Lempens , Rogier Hendrikus Magdalena Cortie , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Siegfried Alexander Tromp , Theodorus Wilhelmus Polet , Jim Vincent Overkamp , Van Vuong Vy
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
摘要： An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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公开(公告)号：US10192772B2
公开(公告)日：2019-01-29
申请号：US15766740
申请日：2016-09-08
发明人： Satish Achanta , Tiannan Guan , Raymond Wilhelmus Louis LaFarre , Ilya Malakhovsky , Bas Johannes Petrus Roset , Siegfried Alexander Tromp , Johannes Petrus Martinus Bernardus Vermeulen
IPC分类号： G03F7/20 , H01L21/687 , H01L21/683 , G03F7/00
摘要： A substrate table to support a substrate, the substrate table including a main body, burls extending from the main body and having first upper ends that define a support surface to support the substrate, and support pins having second upper ends. The support pins are movable between a retracted position and an extended position. The support pins are arranged to support the substrate in the extended position. The support pins are arranged to be switched to a first stiffness mode and a second stiffness mode. In the first stiffness mode, the support pins have a first stiffness in a direction parallel to the support surface. In the second stiffness mode, the support pins have a second stiffness in the direction parallel to the support surface. The first stiffness is different from the second stiffness.
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公开(公告)号：US09915877B2
公开(公告)日：2018-03-13
申请号：US15629399
申请日：2017-06-21
发明人： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Wilhelmus Franciscus Johannes Simons , Martijn Houben , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Han Henricus Aldegonda Lempens , Rogier Hendrikus Magdalena Cortie , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Siegfried Alexander Tromp , Theodorus Wilhelmus Polet , Jim Vincent Overkamp , Van Vuong Vy
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
摘要： An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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公开(公告)号：US11898601B2
公开(公告)日：2024-02-13
申请号：US17407778
申请日：2021-08-20
发明人： Siegfried Alexander Tromp , Antonie Hendrik Verweij , Abraham Alexander Soethoudt , Jan Pieter Van De Poel , Mark Constant Johannes Baggen
IPC分类号： F16C32/06 , H01L21/683 , F16C29/02 , G03F7/00 , G03F7/20
CPC分类号： F16C32/0611 , F16C29/025 , F16C32/0607 , G03F7/20 , G03F7/707 , G03F7/708 , H01L21/6831 , H01L21/6833
摘要： A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.
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公开(公告)号：US11098759B2
公开(公告)日：2021-08-24
申请号：US16735131
申请日：2020-01-06
发明人： Siegfried Alexander Tromp , Antonie Hendrik Verweij , Abraham Alexander Soethoudt , Jan Pieter Van De Poel , Mark Constant Johannes Baggen
IPC分类号： H01L21/683 , G03F7/20 , F16C32/06 , F16C29/02
摘要： A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.
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公开(公告)号：US10527092B2
公开(公告)日：2020-01-07
申请号：US15513086
申请日：2015-10-07
发明人： Siegfried Alexander Tromp , Antonie Hendrik Verweij , Abraham Alexander Soethoudt , Jan Pieter Van De Poel , Mark Constant Johannes Baggen
IPC分类号： F16C32/06 , G03F7/20 , F16C29/02 , H01L21/683
摘要： A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate.
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公开(公告)号：US10018926B2
公开(公告)日：2018-07-10
申请号：US15314841
申请日：2015-05-07
发明人： Rogier Hendrikus Magdalena Cortie , Christianus Wilhelmus Johannes Berendsen , Andre Bernardus Jeunink , Adrianus Hendrik Koevoets , Jim Vincent Overkamp , Siegfried Alexander Tromp , Van Vuong Vy , Daniel Elza Roeland Audenaerdt
CPC分类号： G03F7/7095 , G03F7/70341 , G03F7/70733 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.
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9.发明授权公开(公告)号：US11664264B2
公开(公告)日：2023-05-30
申请号：US16075754
申请日：2016-12-22
发明人： Andre Bernardus Jeunink , Robby Franciscus Josephus Martens , Youssef Karel Maria De Vos , Ringo Petrus Cornelis Van Dorst , Gerhard Albert Ten Brinke , Dirk Jerome Andre Senden , Coen Hubertus Matheus Baltis , Justin Johannes Hermanus Gerritzen , Jelmer Mattheüs Kamminga , Evelyn Wallis Pacitti , Thomas Poiesz , Arie Cornelis Scheiberlich , Bert Dirk Scholten , André Schreuder , Abraham Alexander Soethoudt , Siegfried Alexander Tromp , Yuri Johannes Gabriël Van De Vijver
IPC分类号： H01L21/683 , H01L21/687 , G03F7/20 , B25B11/00
CPC分类号： H01L21/6838 , B25B11/005 , G03F7/707 , G03F7/70733 , H01L21/68742
摘要： A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.
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公开(公告)号：US11579533B2
公开(公告)日：2023-02-14
申请号：US17151291
申请日：2021-01-18
发明人： Günes Nakiboglu , Coen Hubertus Matheus Baltis , Siegfried Alexander Tromp , Yuri Johannes Gabriël Van De Vijver , Bert Dirk Scholten , Daan Daniel Johannes Antonius Van Sommeren , Mark Johannes Hermanus Frencken
IPC分类号： G03F7/20 , H01L21/027 , H01L21/687
摘要： A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.
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