公开(公告)号：US10705438B2

公开(公告)日：2020-07-07

申请号：US16716568

申请日：2019-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus Jeunink ,  Laurentius Johannes Adrianus Van Bokhoven ,  Stan Henricus Van Der Meulen ,  Yang-Shan Huang ,  Federico La Torre ,  Bearrach Moest ,  Stefan Carolus Jacobus Antonius Keij ,  Enno Van Den Brink ,  Christine Henriette Schouten ,  Hoite Pieter Theodoor Tolsma

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/62

Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

公开(公告)号：US10514615B2

公开(公告)日：2019-12-24

申请号：US15580806

申请日：2016-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus Jeunink ,  Robbert De Jong ,  Martinus Hendrikus Antonius Leenders ,  Evelyn Wallis Pacitti ,  Thomas Poiesz ,  Frank Pieter Albert Van Den Berkmortel

IPC: G03B27/58 ,  G03F7/20

Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.

公开(公告)号：US09915880B2

公开(公告)日：2018-03-13

申请号：US15077439

申请日：2016-03-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Andre Bernardus Jeunink ,  Robbert Edgar Van Leeuwen ,  Emiel Jozef Melanie Eussen

IPC: G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70775 ,  G03F7/7085

Abstract: A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.

公开(公告)号：US20180067398A1

公开(公告)日：2018-03-08

申请号：US15314841

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Christianus Wilhelmus Berendsen ,  Andre Bernardus Jeunink ,  Adrianus Hendrik Koevoets ,  Jim Vincent Overkamp ,  Sigfried Alexander Tromp ,  Van Vuong Vy ,  Daniel Elza Roeland Audenaerdt

IPC: G03F7/20

CPC classification number: G03F7/7095 ,  G03F7/70341 ,  G03F7/70733 ,  G03F7/70875 ,  G03F7/70891

Abstract: A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.

公开(公告)号：US09383659B2

公开(公告)日：2016-07-05

申请号：US14407038

申请日：2013-06-13

Applicant: ASML Netherlands B.V.

Inventor： Ruud Antonius Catharina Maria Beerens ,  Andre Bernardus Jeunink ,  Marinus Maria Johannes Van De Wal ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Richard Henricus Adrianus Van Lieshout ,  Henricus Martinus Johannes Van De Groes ,  Saartje Willemijn Van Der Hoeven

IPC: G03B27/58 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70783

Abstract: There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system includes a support, a position measurement device, a deformation sensor and a processor. The support is constructed to hold the object. The position measurement device is configured to measure a position of the support. The position measurement device includes at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.

Abstract translation: 提供了一种用于将物体定位在光刻设备中的定位系统。 定位系统包括支撑件，位置测量装置，变形传感器和处理器。 构造支撑件来保持对象。 位置测量装置被配置为测量支撑件的位置。 所述位置测量装置包括至少一个位置传感器目标和多个位置传感器，以与所述至少一个位置传感器目标配合，以提供代表所述支撑件的位置的冗余的一组位置信号。 变形传感器被布置成提供表示支撑件和位置测量装置之一的变形的变形信号。 处理器被配置为基于变形信号和冗余的位置信号集来校准位置测量装置和变形传感器之一。

公开(公告)号：US20150241795A1

公开(公告)日：2015-08-27

申请号：US14430507

申请日：2013-09-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Dekkers ,  Andre Bernardus Jeunink ,  Erik Roelof Loopstra ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Michael Jozef Mathijs Renkens ,  Carolus Johannes Catharina Schoormans ,  Peter Hoekstra

IPC: G03F7/20 ,  G01D18/00 ,  G01D5/347

CPC classification number: G03F7/70775 ,  G01D5/2449 ,  G01D5/34707 ,  G01D18/00 ,  G01D18/008 ,  G03F7/70516

Abstract: A method for calibrating an encoder scale having an array of marks in a first direction, includes moving the encoder scale in the first direction relative to a first encoder-type sensor, a second encoder-type sensor and a third encoder-type sensor, wherein the first encoder-type sensor and the second encoder-type sensor are fixedly spaced in the first direction at a first distance relative to each other, wherein the second encoder-type sensor and the third encoder-type sensor are fixedly spaced in the first direction at a second distance relative to each other.

Abstract translation: 一种用于校准具有第一方向的标记阵列的编码器刻度的方法，包括相对于第一编码器型传感器，第二编码器型传感器和第三编码器型传感器沿第一方向移动编码器刻度，其中 第一编码器型传感器和第二编码器型传感器在第一方向上相对于彼此以第一距离固定间隔，其中第二编码器型传感器和第三编码器型传感器在第一方向上固定间隔开 在相对于彼此的第二距离处。

公开(公告)号：US11635696B2

公开(公告)日：2023-04-25

申请号：US17120506

申请日：2020-12-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus De Schiffart ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Andre Bernardus Jeunink ,  Gregor Edward Van Baars ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Norbert Erwin Therenzo Jansen ,  Toon Hardeman ,  George Arie Jan De Fockert ,  Johan Frederik Dijksman

IPC: G03F7/20 ,  G03F7/00 ,  G03F9/00

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US09958774B2

公开(公告)日：2018-05-01

申请号：US15258903

申请日：2016-09-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Arie Jeffrey Den Boef ,  Andre Bernardus Jeunink ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman

IPC: G03F9/00 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7042

Abstract: A method of determining a position of an imprint template in an imprint lithography apparatus is disclosed. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.

公开(公告)号：US09470988B2

公开(公告)日：2016-10-18

申请号：US14437441

申请日：2013-10-17

Applicant: ASML Netherlands B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Albert Johannes Maria Jansen ,  Andre Bernardus Jeunink ,  Johannes Mathias Theodorus Antonius Adriaens ,  Frank Auer ,  Peterjan Broomans ,  Suzanne Johanna Antonetta Geertruda Cosijns ,  Willem Herman Gertruda Anna Koenen ,  Sebastiaan Smit ,  Joris Wilhelmus Henricus Vermunt

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70516 ,  G03F7/70716

Abstract: A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table.

Abstract translation: 一种用于将物体定位在光刻设备中的定位系统，包括：可在操作区域中移动的第一和第二物镜台; 第一位置测量系统，用于在操作区域中提供相对于参考的第二对象表的增量位置测量，其中第一位置测量系统被配置为提供第一对象表相对于参考的绝对位置测量; 第二位置测量系统，用于提供相对于第二对象表的第一对象表的绝对位置测量，并且其中，第一位置测量系统还被配置为提供第二对象表相对于参考的绝对位置测量，基于 第一对象表相对于参考的绝对位置测量以及第一对象表相对于第二对象表的绝对位置测量。

公开(公告)号：US20150277242A1

公开(公告)日：2015-10-01

申请号：US14437441

申请日：2013-10-17

Applicant: ASML Netherlands B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Albert Johannes Maria Jansen ,  Andre Bernardus Jeunink ,  Johannes Mathias Theodorus Antonius Adriaens ,  Frank Auer ,  Peterjan Broomans ,  Suzanne Johanna Antonetta Geertruda Cosijns ,  Willem Herman Gertruda Anna Koenen ,  Sebastiaan Smit ,  Joris Wilhelmus Henricus Vermunt

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70516 ,  G03F7/70716

Abstract: A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table.

Abstract translation: 一种用于将物体定位在光刻设备中的定位系统，包括：可在操作区域中移动的第一和第二物镜台; 第一位置测量系统，用于在操作区域中提供相对于参考的第二对象表的增量位置测量，其中第一位置测量系统被配置为提供第一对象表相对于参考的绝对位置测量; 第二位置测量系统，用于提供相对于第二对象表的第一对象表的绝对位置测量，并且其中，第一位置测量系统还被配置为提供第二对象表相对于参考的绝对位置测量，基于 第一对象表相对于参考的绝对位置测量以及第一对象表相对于第二对象表的绝对位置测量。