Invention Grant
- Patent Title: Multiple patterning process for forming pillar mask elements
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Application No.: US15253097Application Date: 2016-08-31
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Publication No.: US10026645B2Publication Date: 2018-07-17
- Inventor: Shyam Pal , Granger Lobb , Aleksandra Clancy
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Amerson Law Firm, PLLC
- Main IPC: H01L21/4763
- IPC: H01L21/4763 ; H01L21/768 ; H01L21/033 ; H01L21/311
Abstract:
A method includes forming a stack of hard mask layers above a process layer. The stack includes first, second and third hard mask layers. The third hard mask layer is patterned to define therein a first mask element and to expose portions of the second hard mask layer. The second hard mask layer is patterned to define therein a second mask element below the first mask element and a third mask element, and to expose portions of the first hard mask layer. The first hard mask layer is patterned to define therein a fourth mask element below the second mask element, a fifth mask element below the third mask element, and a sixth mask element, and to expose portions of the process layer. The process layer is etched to remove portions of the process layer not covered by the first hard mask layer.
Public/Granted literature
- US20180061699A1 MULTIPLE PATTERNING PROCESS FOR FORMING PILLAR MASK ELEMENTS Public/Granted day:2018-03-01
Information query
IPC分类:
