- 专利标题: Metal-film forming apparatus and metal-film forming method
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申请号: US14979914申请日: 2015-12-28
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公开(公告)号: US10077505B2公开(公告)日: 2018-09-18
- 发明人: Motoki Hiraoka , Hiroshi Yanagimoto , Yuki Sato
- 申请人: TOYOTA JIDOSHA KABUSHIKI KAISHA
- 申请人地址: JP Toyota-shi, Aichi-ken
- 专利权人: TOYOTA JIDOSHA KABUSHIKI KAISHA
- 当前专利权人: TOYOTA JIDOSHA KABUSHIKI KAISHA
- 当前专利权人地址: JP Toyota-shi, Aichi-ken
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2014-265915 20141226
- 主分类号: C25D17/00
- IPC分类号: C25D17/00 ; C25D3/12 ; C25D3/46 ; C25D3/48 ; C25D5/02 ; H05K3/24 ; C25D3/00 ; C25D17/14 ; C25D3/38
摘要:
A metal-film forming apparatus includes: an anode; a resin substrate having a surface on which a conductor pattern layer that serves as a cathode is formed; a solid electrolyte membrane that contains metal ions and is between the anode and the resin substrate, the solid electrolyte membrane contacting a surface of the conductor pattern layer when a metal film is formed; a power supply; and a conductive member that is arranged contacting the conductor pattern layer when the metal film is formed, such that a negative electrode of the power supply is electrically connected to the conductor pattern layer, the conductive member being detachable from the conductor pattern layer, wherein the metal ions are reduced to deposit metal that forms the metal film on the surface of the conductor pattern layer when the voltage is applied.
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