Invention Grant
- Patent Title: Test structures for dielectric reliability evaluations
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Application No.: US14742895Application Date: 2015-06-18
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Publication No.: US10103060B2Publication Date: 2018-10-16
- Inventor: David G. Brochu, Jr. , Roger A. Dufresne , Baozhen Li , Barry P. Linder , James H. Stathis , Ernest Y. Wu
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Thompson Hine LLP
- Agent Anthony Canale
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L21/66 ; G01R31/44 ; G01R27/26 ; G01R31/28

Abstract:
Methods and test structures for testing the reliability of a dielectric material. The test structure may include a first row of contacts and a line comprised of a conductor. The line is laterally spaced in a direction at a minimum distance from the first row of contacts. The test structure further includes a second row of contacts laterally spaced in the direction from the first row of contacts by a distance equal to two times a minimum pitch. The line is laterally positioned between the first row of contacts and the second row of contacts.
Public/Granted literature
- US20160372389A1 TEST STRUCTURES FOR DIELECTRIC RELIABILITY EVALUATIONS Public/Granted day:2016-12-22
Information query
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