公开(公告)号：US10103060B2

公开(公告)日：2018-10-16

申请号：US14742895

申请日：2015-06-18

Applicant: GLOBALFOUNDRIES INC.

Inventor： David G. Brochu, Jr. ,  Roger A. Dufresne ,  Baozhen Li ,  Barry P. Linder ,  James H. Stathis ,  Ernest Y. Wu

IPC: H01L21/768 ,  H01L21/66 ,  G01R31/44 ,  G01R27/26 ,  G01R31/28

Abstract: Methods and test structures for testing the reliability of a dielectric material. The test structure may include a first row of contacts and a line comprised of a conductor. The line is laterally spaced in a direction at a minimum distance from the first row of contacts. The test structure further includes a second row of contacts laterally spaced in the direction from the first row of contacts by a distance equal to two times a minimum pitch. The line is laterally positioned between the first row of contacts and the second row of contacts.