Invention Grant
- Patent Title: Inductive monitoring of conductive trench depth
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Application No.: US15694632Application Date: 2017-09-01
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Publication No.: US10103073B2Publication Date: 2018-10-16
- Inventor: Wei Lu , Zhefu Wang , Zhihong Wang , Hassan G. Iravani , Dominic J. Benvegnu , Ingemar Carlsson , Boguslaw A. Swedek , Wen-Chiang Tu
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/302 ; H01L21/66 ; H01L21/321 ; B24B37/013 ; B24B37/04

Abstract:
In fabrication of an integrated circuit having a layer with a plurality of conductive interconnects, a layer of a substrate is polished to provide the layer of the integrated circuit. The layer of the substrate includes conductive lines to provide the conductive interconnects. The layer of the substrate includes a closed conductive loop formed of a conductive material in a trench. A depth of the conductive material in the trench is monitored using an inductive monitoring system and a signal is generated. Monitoring includes generating a magnetic field that intermittently passes through the closed conductive loop. A sequence of values over time is extracted from the signal, the sequence of values representing the depth of the conductive material over time.
Public/Granted literature
- US20170365532A1 INDUCTIVE MONITORING OF CONDUCTIVE TRENCH DEPTH Public/Granted day:2017-12-21
Information query
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