Invention Grant
- Patent Title: Process chamber pressure control system and method
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Application No.: US13809610Application Date: 2010-07-14
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Publication No.: US10161567B2Publication Date: 2018-12-25
- Inventor: Daniel J. Vestyck
- Applicant: Daniel J. Vestyck
- Applicant Address: GB Newport
- Assignee: SPTS Technologies Limited
- Current Assignee: SPTS Technologies Limited
- Current Assignee Address: GB Newport
- Agency: Wolf, Greenfield & Sacks, P.C.
- International Application: PCT/US2010/041906 WO 20100714
- International Announcement: WO2012/008954 WO 20120119
- Main IPC: F17C13/00
- IPC: F17C13/00 ; C23C16/455 ; H01L21/67 ; H01L21/311

Abstract:
A method of and apparatus for controlling pressure in a process chamber having a continuous gas inlet flow and a continuous gas outlet flow comprising providing a pulsed valve at a gas outlet, a pressure gauge, and a programmable controller and varying the pulse rate of the pulsed valve, wherein either the open time or closed time, or both open and closed times, is lengthened or shortened, depending on whether the gauge pressure is above or below the programmed setpoint.
Public/Granted literature
- US20130153045A1 PROCESS CHAMBER PRESSURE CONTROL SYSTEM AND METHOD Public/Granted day:2013-06-20
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