- Patent Title: In-situ contactless monitoring of photomask pellicle degradation
-
Application No.: US14932372Application Date: 2015-11-04
-
Publication No.: US10161915B2Publication Date: 2018-12-25
- Inventor: Remi Riviere , Arthur Hotzel
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES
- Current Assignee: GLOBALFOUNDRIES
- Current Assignee Address: KY Grand Cayman
- Agency: Ditthavong & Steiner, P. C.
- Main IPC: G01N29/46
- IPC: G01N29/46 ; G01N29/24 ; G03F1/62 ; G03F1/84 ; G01N29/11 ; G01N29/34

Abstract:
A method and apparatus for detecting changes in the vibrational mode spectra and/or elasticity of a pellicle without reliance upon visual inspection are provided. Embodiments include providing a pellicle, a lower surface of the pellicle attached to a photomask; directing light from a light source onto an upper surface of the pellicle at an angle to the upper surface; causing a deflection of the pellicle concurrently with the light being directed onto the pellicle; detecting light reflected off of the deflected pellicle; and characterizing a vibrational mode of the pellicle based on the detection.
Public/Granted literature
- US20170122913A1 IN-SITU CONTACTLESS MONITORING OF PHOTOMASK PELLICLE DEGRADATION Public/Granted day:2017-05-04
Information query