P-side layers for short wavelength light emitters
Abstract:
A light emitting device includes a p-side heterostructure having a short period superlattice (SPSL) formed of alternating layers of AlxhighGa1-xhighN doped with a p-type dopant and AlxlowGa1-xlowN doped with the p-type dopant, where xlow≤xhigh≤0.9. Each layer of the SPSL has a thickness of less than or equal to about six bi-layers of AlGaN.
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