Abstract:
An optical device has a first optical layer with a first dispersion response as a first function of wavelength. A second optical layer has a second dispersion response as a function of wavelength that is different than the first function. A separating layer is located between the first and second optical layers and has a lower refractive index than the first layer and the second layer. A thickness of the separating layer is selected such that the first and second dispersion responses combine to create an anomalous dispersion about a target wavelength. The anomalous dispersion results in the optical device emitting a wideband coherent optical output about the target wavelength in response to an optical input at the target wavelength.
Abstract:
An ultraviolet (UV) radiation emitting device includes an epitaxial heterostructure comprising an AlGaInN active region. The AlGaInN active region includes one or more quantum well structures with Al content greater than about 50% and having a non-c-plane crystallographic growth orientation. The AlGaInN active region is configured to generate UV radiation in response to excitation by an electron beam generated by an electron beam pump source.
Abstract:
A device includes one or more reflector components. Each reflector component comprises layer pairs of epitaxially grown reflective layers and layers of a non-epitaxial material, such as air. Vias extend through at least some of the layers of the reflector components. The device may include a light emitting layer.
Abstract:
Diode includes first metal layer, coupled to p-type III-N layer and to first terminal, has a substantially equal lateral size to the p-type III-N layer. Central portion of light emitting region on first side and first metal layer includes first via that is etched through p-type portion, light emitting region and first part of n-type III-N portion. Second side of central portion of light emitting region that is opposite to first side includes second via connected to first via. Second via is etched through second part of n-type portion. First via includes second metal layer coupled to intersection between first and second vias. Electrically-insulating layer is coupled to first metal layer, first via, and second metal layer. First terminals are exposed from electrically-insulating layer. Third metal layer including second terminal is coupled to n-type portion on second side of light emitting region and to second metal layer through second via.
Abstract:
Diode includes light emitting region, first metal layer, dielectric layer, and second metal layer. Light emitting diode includes n-type group III-nitride portion, p-type group III-nitride layer, and light emitting region sandwiched between n- and p-type layers. First metal layer may be coupled to p-type III-N portion and plurality of first terminals. First metal layer and p-type III-N portion may have substantially similar lateral size that is smaller than 200 micrometers. A portion of light emitting region and first metal layer may include a single via. Electrically-insulating layer may be coupled to first metal layer and sides of the single via. First terminals may be exposed from electrically-insulating layer. Second metal layer may include second terminal and may be coupled to electrically-insulating layer and to n-type III-N portion through the single via. The thickness of the diode excluding second terminal may be between 2 and 20 micrometers. Other embodiments are described.
Abstract:
A semiconductor light emitting device includes a light guiding structure, a light emitting layer disposed within the light guiding structure, and a structure for discharging excess electric charge within the device. The device may be excited by an electron beam, as opposed to an optical beam, to create electron-hole pairs. The light emitting layer is configured for light generation without requiring a p-n junction, and is therefore not embedded within nor part of a p-n junction. Doping with p-type species is obviated, reducing device loss and permitting operation at a short wavelengths, such as below 300 nm. Various structures, such as a top-side cladding layer, are disclosed for discharging beam-induced charge. A single device may be operated with multiple electron beam pumps, either to enable a relatively thick active layer or to drive multiple separate active layers. Cooperatively curved end facets accommodate for possible off-axis resonance within the active region(s).
Abstract:
A transistor includes a first layer comprising a group III-nitride semiconductor. A second layer comprising a group III-nitride semiconductor is disposed over the first layer. A third layer comprising a group III-nitride semiconductor is disposed over the second layer. An interface between the second layer and the third layer form a polarization heterojunction. A fourth layer comprising a group III-nitride semiconductor is disposed over the third layer. An interface between the third layer and the fourth layer forms a pn junction. A first electrical contact pad is disposed on the fourth layer. A second electrical contact pad is disposed on the third layer. A third electrical contact pad is electronically coupled to bias the polarization heterojunction.
Abstract:
A mask material is deposited on a substrate or growth template. The substrate or growth template is compatible with crystalline growth of a crystalline optical material. Patterned portions of the mask material are removed to expose one or more regions of the substrate or growth template. The one or more regions have target shapes of one or more optical components. The crystalline optical material is selectively grown in the one or more regions to form the one or more optical components.
Abstract:
An optical device has a first optical layer with a first dispersion response as a first function of wavelength. A second optical layer has a second dispersion response as a function of wavelength that is different than the first function. A separating layer is located between the first and second optical layers and has a lower refractive index than the first layer and the second layer. A thickness of the separating layer is selected such that the first and second dispersion responses combine to create an anomalous dispersion about a target wavelength. The anomalous dispersion results in the optical device emitting a wideband coherent optical output about the target wavelength in response to an optical input at the target wavelength.
Abstract:
A method of forming a laser involves forming, on a substrate, a first epitaxial part of the laser that includes at least an active region layer surrounded by first and second waveguide layers. A dielectric layer is formed over the first epitaxial part. Two or more mask openings are patterned within the dielectric layer. The mask openings extend normal to a light-propagation direction of the laser and are spaced apart in the light-propagation direction of the laser. A second epitaxial part of the laser is formed in the mask openings using selective area epitaxy. The second epitaxial part includes a refractive grating with three-dimensional grating features.