Invention Grant
- Patent Title: Combined anneal and selective deposition process
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Application No.: US15132091Application Date: 2016-04-18
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Publication No.: US10204782B2Publication Date: 2019-02-12
- Inventor: Jan Willem Maes , Werner Knaepen , Roel Gronheid , Arjun Singh
- Applicant: ASM IP Holding B.V. , IMEC VZW
- Applicant Address: BE Leuven NL Almere
- Assignee: IMEC vzw,ASM IP HOLDING B.V.
- Current Assignee: IMEC vzw,ASM IP HOLDING B.V.
- Current Assignee Address: BE Leuven NL Almere
- Agency: Knobbe, Martens, Olson & Bear LLP
- Main IPC: H01L21/33
- IPC: H01L21/33 ; H01L21/033 ; G03F7/00 ; H01L21/02 ; H01L21/027 ; H01L21/32
Abstract:
A method for forming a film with an annealing step and a deposition step is disclosed. The method comprises an annealing step for inducing self-assembly or alignment within a polymer. The method also comprises a selective deposition step in order to enable selective deposition on a polymer.
Public/Granted literature
- US20170301542A1 COMBINED ANNEAL AND SELECTIVE DEPOSITION PROCESS Public/Granted day:2017-10-19
Information query
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