- 专利标题: High rate electric field driven nanoelement assembly on an insulated surface
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申请号: US15350636申请日: 2016-11-14
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公开(公告)号: US10233559B2公开(公告)日: 2019-03-19
- 发明人: Asli Sirman , Ahmed Busnaina , Cihan Yilmaz , Jun Huang , Sivasubramanian Somu
- 申请人: Northeastern University
- 申请人地址: US MA Boston
- 专利权人: Northeastern University
- 当前专利权人: Northeastern University
- 当前专利权人地址: US MA Boston
- 代理机构: Arent Fox LLP
- 主分类号: C25D13/22
- IPC分类号: C25D13/22 ; H05K1/03 ; H05K1/09 ; H05K3/12 ; C25D13/12 ; C25D13/04 ; C25D13/20 ; C09D5/44 ; C09D125/06 ; B82Y40/00 ; H05K1/02 ; H01L21/02 ; H01L29/06 ; B82Y30/00
摘要:
A method for high rate assembly of nanoelements into two-dimensional void patterns on a non-conductive substrate surface utilizes an applied electric field to stabilize against forces resulting from pulling the substrate through the surface of a nanoelement suspension. The electric field contours emanating from a conductive layer in the substrate, covered by an insulating layer, are modified by a patterned photoresist layer, resulting in an increased driving force for nanoelements to migrate from a liquid suspension to voids on a patterned substrate having a non-conductive surface. The method can be used for the production of microscale and nanoscale circuits, sensors, and other electronic devices.
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