发明授权
- 专利标题: Block copolymer
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申请号: US15515293申请日: 2015-09-30
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公开(公告)号: US10240035B2公开(公告)日: 2019-03-26
- 发明人: Je Gwon Lee , No Jin Park , Jung Keun Kim , Se Jin Ku , Mi Sook Lee , Eun Young Choi , Sung Soo Yoon , Hyung Ju Ryu
- 申请人: LG Chem, Ltd.
- 申请人地址: KR
- 专利权人: LG Chem, Ltd.
- 当前专利权人: LG Chem, Ltd.
- 当前专利权人地址: KR
- 代理机构: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- 优先权: KR10-2014-0131964 20140930; KR10-2015-0079483 20150604
- 国际申请: PCT/KR2015/010313 WO 20150930
- 国际公布: WO2016/052994 WO 20160407
- 主分类号: C08J7/12
- IPC分类号: C08J7/12 ; C08L53/00 ; C08F212/08 ; C08F216/12 ; C08F220/10 ; C08F220/26 ; C08F220/30 ; C08J5/18 ; B05D1/00 ; B05D3/00 ; C08F293/00 ; C09D153/00 ; G03F7/09 ; G03F7/16 ; G03F7/004 ; G03F7/039 ; G03F7/20 ; C08F32/06 ; C08F299/02 ; C08G61/08 ; C08F2/14 ; G03F7/00 ; G03F7/30 ; C08L53/02 ; C08G61/12 ; B81C1/00 ; B82Y40/00
摘要:
The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.
公开/授权文献
- US20170226261A1 BLOCK COPOLYMER 公开/授权日:2017-08-10