- Patent Title: High-voltage light emitting diode and fabrication method thereof
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Application No.: US15810076Application Date: 2017-11-12
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Publication No.: US10242958B2Publication Date: 2019-03-26
- Inventor: Gaolin Zheng , Ling-yuan Hong , Xiaoxiong Lin , Feng Wang , Su-hui Lin , Chia-hung Chang
- Applicant: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Xiamen
- Assignee: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Xiamen
- Agency: Syncoda LLC
- Agent Feng Ma
- Priority: CN201510987688 20151225
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L27/00 ; H01L33/00 ; H01L23/60 ; H01L27/15 ; H01L33/38 ; H01L33/62 ; H01L33/64 ; H01L33/44

Abstract:
A fabrication method of a high-voltage light-emitting diode includes the steps of providing a substrate, and forming a light-emitting epitaxial laminated layer on the substrate; patterning the light-emitting epitaxial laminated layer and fabricating a channel that exposes the substrate surface so as to divide the light-emitting epitaxial laminated layer into a plurality of light-emitting diode units, and the light-emitting diode units at least constitute two rows; fabricating an electrode interconnection line crossing the channel, wherein, two adjacent light-emitting diode units are connected by the electrode interconnection line; fabricating an electrode bonding pad over the outmost light-emitting diode unit of the high-voltage light-emitting diode; and fabricating an insulating protective layer opening at the channel where the potential difference of any two adjacent light-emitting diodes is ≥3 times of the forward voltage of a single light-emitting diode to avoid breakdown of the light-emitting epitaxial laminated layer.
Public/Granted literature
- US20180076152A1 High-voltage Light Emitting Diode and Fabrication Method Thereof Public/Granted day:2018-03-15
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