Invention Grant
- Patent Title: Three-dimensional memory device containing annular etch-stop spacer and method of making thereof
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Application No.: US15704370Application Date: 2017-09-14
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Publication No.: US10242994B2Publication Date: 2019-03-26
- Inventor: Takashi Inomata , Nobuo Hironaga , Junichi Ariyoshi , Tadashi Nakamura
- Applicant: SANDISK TECHNOLOGIES LLC
- Applicant Address: US TX Addison
- Assignee: SANDISK TECHNOLOGIES LLC
- Current Assignee: SANDISK TECHNOLOGIES LLC
- Current Assignee Address: US TX Addison
- Agency: The Marbury Law Group PLLC
- Main IPC: H01L27/11524
- IPC: H01L27/11524 ; H01L27/11556 ; H01L27/1157 ; H01L27/11582 ; H01L21/768 ; H01L23/522 ; H01L23/528 ; H01L27/11565 ; H01L27/11519 ; H01L29/792 ; H01L27/11575

Abstract:
A monolithic three-dimensional memory device includes a first alternating stack of first insulating layers and first electrically conductive layers located over a top surface of a substrate, an insulating cap layer overlying the first alternating stack, a second alternating stack of second insulating layers and second electrically conductive layers and overlying the insulating cap layer, memory openings extending through the second alternating stack, the insulating cap layer, and the first alternating stack, memory stack structures located within the memory openings, and annular spacers located within the insulating cap layer and laterally surrounding a respective one of the memory stack structures.
Public/Granted literature
- US20180006049A1 THREE-DIMENSIONAL MEMORY DEVICE CONTAINING ANNULAR ETCH-STOP SPACER AND METHOD OF MAKING THEREOF Public/Granted day:2018-01-04
Information query
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