Invention Grant
- Patent Title: Near field metrology
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Application No.: US14583447Application Date: 2014-12-26
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Publication No.: US10261014B2Publication Date: 2019-04-16
- Inventor: Noam Sapiens , Joel Seligson , Vladimir Levinski , Daniel Kandel , Yoel Feler , Barak Bringoltz , Amnon Manassen , Eliav Benisty
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G01N21/55
- IPC: G01N21/55 ; G01N21/47 ; G02B27/56 ; G02B27/58

Abstract:
Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.
Public/Granted literature
- US20150198524A1 NEAR FIELD METROLOGY Public/Granted day:2015-07-16
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