Invention Grant
- Patent Title: Rough layer for better anti-stiction deposition
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Application No.: US15138419Application Date: 2016-04-26
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Publication No.: US10273141B2Publication Date: 2019-04-30
- Inventor: Chih-Hang Chang , I-Shi Wang , Jen-Hao Liu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: B81B3/00
- IPC: B81B3/00 ; B81C1/00

Abstract:
A microelectromechanical systems (MEMS) package with roughness for high quality anti-stiction is provided. A device substrate is arranged over a support device. The device substrate comprises a movable element with a lower surface that is rough and that is arranged within a cavity. A dielectric layer is arranged between the support device and the device substrate. The dielectric layer laterally encloses the cavity. An anti-stiction layer lines the lower surface of the movable element. A method for manufacturing the MEMS package is also provided.
Public/Granted literature
- US20170305738A1 Rough Layer for Better Anti-Stiction Deposition Public/Granted day:2017-10-26
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