Invention Grant
- Patent Title: Dust collecting apparatus, substrate processing system, and method of manufacturing semiconductor device
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Application No.: US15239243Application Date: 2016-08-17
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Publication No.: US10290490B2Publication Date: 2019-05-14
- Inventor: Tomohiko Sugita , Hiroyasu Iimori , Yoshihiro Ogawa
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-034316 20160225
- Main IPC: B01D43/00
- IPC: B01D43/00 ; H01L21/02 ; B01D49/00 ; B08B3/12 ; H01L21/687 ; B01D21/28 ; B01D51/08 ; H01L21/67

Abstract:
In one embodiment, a dust collecting apparatus includes a container configured to contain a fluid that includes particles to be collected. The apparatus further includes one or more sound sources configured to generate, in the container, a standing sound wave including at least one node to trap the particles in a vicinity of the node. The one or more sound sources are configured to generate the standing sound wave so that the node does not contact a wall face of the container or contacts a predetermined portion of the wall face of the container. The predetermined portion is formed of a member that prevents the particles from leaving from the node located in a vicinity of the predetermined portion.
Public/Granted literature
- US20170250069A1 DUST COLLECTING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2017-08-31
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