Invention Grant
- Patent Title: Semiconductor device and method for manufacturing the same
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Application No.: US15632764Application Date: 2017-06-26
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Publication No.: US10290745B2Publication Date: 2019-05-14
- Inventor: Shunpei Yamazaki , Tetsuhiro Tanaka , Akihisa Shimomura , Yasumasa Yamane , Ryo Tokumaru , Yuhei Sato , Kazuhiro Tsutsui
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP
- Agency: Husch Blackwell LLP
- Priority: JP2014-249819 20141210; JP2015-096669 20150511
- Main IPC: H01L29/10
- IPC: H01L29/10 ; H01L29/12 ; H01L29/786 ; H01L29/49 ; H01L29/51 ; H01L29/423 ; H01L29/66 ; H01L21/02 ; C23C14/08 ; C23C14/34 ; H01L27/12

Abstract:
A transistor with stable electrical characteristics is provided. The transistor includes a first insulator over a substrate; first to third oxide insulators over the first insulator; a second insulator over the third oxide insulator; a first conductor over the second insulator; and a third insulator over the first conductor. An energy level of a conduction band minimum of each of the first and second oxide insulators is closer to a vacuum level than that of the oxide semiconductor is. An energy level of a conduction band minimum of the third oxide insulator is closer to the vacuum level than that of the second oxide insulator is. The first insulator contains oxygen. The number of oxygen molecules released from the first insulator measured by thermal desorption spectroscopy is greater than or equal to 1E14 molecules/cm2 and less than or equal to 1E16 molecules/cm2.
Public/Granted literature
- US20170294542A1 Semiconductor Device and Method for Manufacturing the Same Public/Granted day:2017-10-12
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