Invention Grant
- Patent Title: Microwave chemical processing
-
Application No.: US15727533Application Date: 2017-10-06
-
Publication No.: US10332726B2Publication Date: 2019-06-25
- Inventor: Michael W. Stowell
- Applicant: Lyten, Inc.
- Applicant Address: US CA Sunnyvale
- Assignee: Lyten, Inc.
- Current Assignee: Lyten, Inc.
- Current Assignee Address: US CA Sunnyvale
- Agency: MLO, a professional corp.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/311 ; H01L21/285 ; H01L21/02 ; C23C16/515 ; C23C16/511 ; C23C16/453 ; C23C16/26 ; B82Y40/00 ; H05H1/30 ; H01L21/3213 ; H05H1/46 ; C01B32/50 ; C01B32/186 ; C01B32/80 ; C01B32/40 ; C01B32/15 ; C01B32/152 ; C01B32/158 ; C01B32/164 ; C01B32/18 ; C01B32/20 ; C01B32/184

Abstract:
Methods and systems include supplying pulsed microwave radiation through a waveguide, where the microwave radiation propagates in a direction along the waveguide. A pressure within the waveguide is at least 0.1 atmosphere. A supply gas is provided at a first location along a length of the waveguide, a majority of the supply gas flowing in the direction of the microwave radiation propagation. A plasma is generated in the supply gas, and a process gas is added into the waveguide at a second location downstream from the first location. A majority of the process gas flows in the direction of the microwave propagation at a rate greater than 5 slm. An average energy of the plasma is controlled to convert the process gas into separated components, by controlling at least one of a pulsing frequency of the pulsed microwave radiation, and a duty cycle of the pulsed microwave radiation.
Public/Granted literature
- US20180138017A1 Microwave Chemical Processing Public/Granted day:2018-05-17
Information query