- 专利标题: Photosensitive resin composition for forming cell culture substrate
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申请号: US15303930申请日: 2015-04-10
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公开(公告)号: US10336976B2公开(公告)日: 2019-07-02
- 发明人: Takahiro Senzaki
- 申请人: TOKYO OHKA KOGYO CO., LTD.
- 申请人地址: JP Kawasaki-Shi
- 专利权人: TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人: TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人地址: JP Kawasaki-Shi
- 代理机构: Knobbe, Martens, Olson & Bear LLP
- 优先权: JP2014-086576 20140418
- 国际申请: PCT/JP2015/061251 WO 20150410
- 国际公布: WO2015/159821 WO 20151022
- 主分类号: G03F7/031
- IPC分类号: G03F7/031 ; G03F7/028 ; C12M3/00 ; C12M1/00 ; B29C41/12 ; C08F2/46 ; C08J7/00 ; B29C35/00 ; B29C35/08 ; B29C41/00 ; B29C41/42 ; B29C71/00 ; B29C71/04 ; B29D7/00 ; B29K33/04 ; B29K67/00 ; B29K71/00 ; B29L7/00
摘要:
A photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, has low cytotoxicity, and that can form a cell culture substrate; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition. The photosensitive resin composition includes a photopolymerizable monomer and a photopolymerization initiator. The photopolymerizable monomer contains a defined amount of a polyfunctional monomer that is at least trifunctional, and the content of the photopolymerization initiator is within a prescribed range.
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