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    Method of forming fine pattern, and developer
    2.
    发明授权
    Method of forming fine pattern, and developer 有权
    形成精细图案的方法和开发者

    公开(公告)号：US08961802B2

    公开(公告)日：2015-02-24

    申请号：US13927464

    申请日：2013-06-26

    申请人： Riken ,  Tokyo Ohka Kogyo Co., Ltd.

    发明人： Shigenori Fujikawa ,  Harumi Hayakawa ,  Takahiro Senzaki ,  Ken Miyagi

    IPC分类号： B81C1/00 ,  H01L21/033 ,  H01L21/308 ,  H01L21/311

    CPC分类号： B81C1/00531 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  H01L21/0337 ,  H01L21/3086 ,  H01L21/31133

    摘要： A method of forming a fine pattern, including: a phase separation step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate, and then the layer is heated for phase separation of the layer; a decomposition step in which at least a portion of a phase of at least one block of the plurality of blocks constituting the block copolymer is decomposed; a selective removal step in which the layer is immersed in a developing solution to selectively remove a phase containing decomposed blocks to form a nano structure; and an etching step in which the substrate is subjected to etching by using the nano structure as a mask; and a main component of the developing solution is an organic solvent having an SP value of 7.5 to 11.5 (cal/cm3)1/2, and having vapor pressure of less than 2.1 kPa at 25° C., or is benzene that may be substituted by an alkyl group, an alkoxy group, or a halogen atom, and the developing solution further contains metal alkoxide.

    摘要翻译： 一种形成精细图案的方法，包括：相位分离步骤，其中在基板上形成含有多个键合的嵌段共聚物的层，然后将该层加热以使该层相分离; 分解步骤，其中构成所述嵌段共聚物的多个嵌段的至少一个嵌段的至少一部分相分解; 选择性去除步骤，其中将该层浸入显影溶液中以选择性地除去含有分解嵌段的相以形成纳米结构; 以及通过使用纳米结构作为掩模对基板进行蚀刻的蚀刻步骤; 显影液的主要成分是在25℃下SP值为7.5〜11.5（cal / cm 3）1/2，蒸气压小于2.1kPa的有机溶剂，也可以是苯 被烷基，烷氧基或卤素原子取代，显影液还含有金属醇盐。

    METHOD OF FORMING FINE PATTERN, AND DEVELOPER
    6.
    发明申请
    METHOD OF FORMING FINE PATTERN, AND DEVELOPER 有权
    形成精细图案的方法和开发者

    公开(公告)号：US20140054265A1

    公开(公告)日：2014-02-27

    申请号：US13927464

    申请日：2013-06-26

    申请人： Tokyo Ohka Kogyo Co., Ltd. ,  Riken

    发明人： Shigenori Fujikawa ,  Harumi Hayakawa ,  Takahiro Senzaki ,  Ken Miyagi

    IPC分类号： B81C1/00

    CPC分类号： B81C1/00531 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  H01L21/0337 ,  H01L21/3086 ,  H01L21/31133

    摘要： A method of forming a fine pattern, including: a phase separation step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate, and then the layer is heated for phase separation of the layer; a decomposition step in which at least a portion of a phase of at least one block of the plurality of blocks constituting the block copolymer is decomposed; a selective removal step in which the layer is immersed in a developing solution to selectively remove a phase containing decomposed blocks to form a nano structure; and an etching step in which the substrate is subjected to etching by using the nano structure as a mask; and a main component of the developing solution is an organic solvent having an SP value of 7.5 to 11.5 (cal/cm3)1/2, and having vapor pressure of less than 2.1 kPa at 25° C., or is benzene that may be substituted by an alkyl group, an alkoxy group, or a halogen atom, and the developing solution further contains metal alkoxide.

    摘要翻译： 一种形成精细图案的方法，包括：相位分离步骤，其中在基板上形成含有多个键合的嵌段共聚物的层，然后将该层加热以使该层相分离; 分解步骤，其中构成所述嵌段共聚物的多个嵌段的至少一个嵌段的至少一部分相分解; 选择性去除步骤，其中将该层浸入显影溶液中以选择性地除去含有分解嵌段的相以形成纳米结构; 以及通过使用纳米结构作为掩模对基板进行蚀刻的蚀刻步骤; 显影液的主要成分是在25℃下SP值为7.5〜11.5（cal / cm 3）1/2，蒸气压小于2.1kPa的有机溶剂，也可以是苯 被烷基，烷氧基或卤素原子取代，显影液还含有金属醇盐。

    Method for manufacturing flow path device
    7.
    发明授权
    Method for manufacturing flow path device 有权

    公开(公告)号：US11167540B2

    公开(公告)日：2021-11-09

    申请号：US16864589

    申请日：2020-05-01

    申请人： TOKYO OHKA KOGYO CO., LTD.

    发明人： Takashi Kamizono ,  Takashi Fujimoto ,  Takahiro Senzaki

    IPC分类号： B32B38/00 ,  B32B37/10

    摘要： A method for manufacturing a flow path device internally provided with a flow path for allowing a liquid to flow by compression bonding two or more members to each other, in which the hydrophilic property of a surface of the flow path can be maintained for a long period of time. A flow path device is manufactured by forming a hydrophilic coating film using a treatment liquid including a hydrophilizing agent in at least one member, the coating film covering a surface of the member at a side to be joined to another member, then irradiating only a joining surface of the coating film with ultraviolet rays or plasma derived from an oxygen-containing gas in the member having the coating film, and irradiating at least the joining surface with ultraviolet rays or plasma derived from an oxygen-containing gas in a member having no coating film, and compression bonding the two or more members.