Invention Grant
- Patent Title: Method and system for delivering hydrogen peroxide to a semiconductor processing chamber
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Application No.: US14660789Application Date: 2015-03-17
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Publication No.: US10343907B2Publication Date: 2019-07-09
- Inventor: Bert Jongbloed , Dieter Pierreux , Cornelius A. van der Jeugd , Lucian Jdira , Radko G. Bankras , Theodorus G. M. Oosterlaken
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Knobbe Martens Olson & Bear
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C01B15/017 ; H01L21/67
Abstract:
In some embodiments, a system is disclosed for delivering hydrogen peroxide to a semiconductor processing chamber. The system includes a process canister for holding a H2O2/H2O mixture in a liquid state, an evaporator provided with an evaporator heater, a first feed line for feeding the liquid H2O2/H2O mixture to the evaporator, and a second feed line for feeding the evaporated H2O2/H2O mixture to the processing chamber, the second feed line provided with a second feed line heater. The evaporator heater is configured to heat the evaporator to a temperature lower than 120° C. and the second feed line heater is configured to heat the feed line to a temperature equal to or higher than the temperature of the evaporator.
Public/Granted literature
- US20150279693A1 METHOD AND SYSTEM FOR DELIVERING HYDROGEN PEROXIDE TO A SEMICONDUCTOR PROCESSING CHAMBER Public/Granted day:2015-10-01
Information query
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