• Patent Title: Electrostatic chuck and wafer processing apparatus
  • Application No.: US15534798
    Application Date: 2015-12-10
  • Publication No.: US10373853B2
    Publication Date: 2019-08-06
  • Inventor: Kazuki AnadaYuichi Yoshii
  • Applicant: TOTO LTD.
  • Applicant Address: JP Fukuoka
  • Assignee: Toto Ltd.
  • Current Assignee: Toto Ltd.
  • Current Assignee Address: JP Fukuoka
  • Agency: Carrier Blackman & Associates, P.C.
  • Agent William D. Blackman; Joseph P. Carrier
  • Priority: JP2014-249729 20141210; JP2015-238822 20151207
  • International Application: PCT/JP2015/084611 WO 20151210
  • International Announcement: WO2016/093297 WO 20160616
  • Main IPC: H01L21/683
  • IPC: H01L21/683 H01L21/67 B23B31/28
Electrostatic chuck and wafer processing apparatus
Abstract:
An electrostatic chuck includes a ceramic dielectric substrate having a first major surface on which an object to be processed is mounted, and a second major surface, the ceramic dielectric substrate being a polycrystalline ceramic sintered body, an electrode layer provided on the ceramic dielectric substrate, a base plate provided on a side of the second major surface and supporting the ceramic dielectric substrate, and a heater provided between the electrode layer and the base plate. The base plate includes a through hole piercing the base plate and a communication path passing a medium adjusting a temperature of the object to be processed, and when viewed in a direction perpendicular to the first major surface, at least a part of the heater exists on a side of the through hole as viewed from a first portion of the communication path which is closest to the through hole.
Public/Granted literature
Information query
Patent Agency Ranking
0/0