Invention Grant
- Patent Title: Electrostatic chuck and wafer processing apparatus
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Application No.: US15534798Application Date: 2015-12-10
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Publication No.: US10373853B2Publication Date: 2019-08-06
- Inventor: Kazuki Anada , Yuichi Yoshii
- Applicant: TOTO LTD.
- Applicant Address: JP Fukuoka
- Assignee: Toto Ltd.
- Current Assignee: Toto Ltd.
- Current Assignee Address: JP Fukuoka
- Agency: Carrier Blackman & Associates, P.C.
- Agent William D. Blackman; Joseph P. Carrier
- Priority: JP2014-249729 20141210; JP2015-238822 20151207
- International Application: PCT/JP2015/084611 WO 20151210
- International Announcement: WO2016/093297 WO 20160616
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/67 ; B23B31/28

Abstract:
An electrostatic chuck includes a ceramic dielectric substrate having a first major surface on which an object to be processed is mounted, and a second major surface, the ceramic dielectric substrate being a polycrystalline ceramic sintered body, an electrode layer provided on the ceramic dielectric substrate, a base plate provided on a side of the second major surface and supporting the ceramic dielectric substrate, and a heater provided between the electrode layer and the base plate. The base plate includes a through hole piercing the base plate and a communication path passing a medium adjusting a temperature of the object to be processed, and when viewed in a direction perpendicular to the first major surface, at least a part of the heater exists on a side of the through hole as viewed from a first portion of the communication path which is closest to the through hole.
Public/Granted literature
- US20180261486A1 ELECTROSTATIC CHUCK AND WAFER PROCESSING APPARATUS Public/Granted day:2018-09-13
Information query
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