- 专利标题: Continuous-wave laser-sustained plasma illumination source
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申请号: US16231048申请日: 2018-12-21
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公开(公告)号: US10381216B2公开(公告)日: 2019-08-13
- 发明人: Ilya Bezel , Anatoly Shchemelinin , Eugene Shifrin , Matthew Panzer
- 申请人: KLA-Tencor Corporation
- 申请人地址: US CA Milpitas
- 专利权人: KLA-Tencor Corporation
- 当前专利权人: KLA-Tencor Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Suiter Swantz pc llo
- 主分类号: H01J65/04
- IPC分类号: H01J65/04 ; H05G2/00
摘要:
An optical system for generating broadband light via light-sustained plasma formation includes a chamber, an illumination source, a set of focusing optics, and a set of collection optics. The chamber is configured to contain a buffer material in a first phase and a plasma-forming material in a second phase. The illumination source generates continuous-wave pump illumination. The set of focusing optics focuses the continuous-wave pump illumination through the buffer material to an interface between the buffer material and the plasma-forming material in order to generate a plasma by excitation of at least the plasma-forming material. The set of collection optics receives broadband radiation emanated from the plasma.
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