Invention Grant
- Patent Title: Semiconductor device and method for manufacturing the same
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Application No.: US15796815Application Date: 2017-10-29
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Publication No.: US10388660B2Publication Date: 2019-08-20
- Inventor: Yoshiyuki Kawashima , Takashi Hashimoto
- Applicant: Renesas Electronics Corporation
- Applicant Address: JP Tokyo
- Assignee: RENESAS ELECTRONICS CORPORATION
- Current Assignee: RENESAS ELECTRONICS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Shapiro, Gabor and Rosenberger, PLLC
- Priority: JP2016-252691 20161227
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L27/1157 ; G11C16/10 ; H01L29/423 ; H01L29/51 ; H01L29/792 ; H01L29/66 ; H01L21/28 ; H01L21/02 ; G11C16/26 ; H01L23/528 ; G11C16/04 ; G11C16/34

Abstract:
A semiconductor device in which the cell size is small and disturbance in reading operation is suppressed, and a method for manufacturing the semiconductor device. A first memory cell has a first memory transistor. A second memory cell has a second memory transistor. A control gate is shared by the first memory cell and the second memory cell. In plan view, the control gate is sandwiched between a first memory gate of the first memory transistor and a second memory gate of the second memory transistor.
Public/Granted literature
- US20180182767A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2018-06-28
Information query
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