Invention Grant
- Patent Title: Pattern-forming method and composition
-
Application No.: US16199767Application Date: 2018-11-26
-
Publication No.: US10394121B2Publication Date: 2019-08-27
- Inventor: Hitoshi Osaki
- Applicant: JSR Corporation
- Applicant Address: JP Minato-ku
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: G03F7/00
- IPC: G03F7/00 ; H01L21/311 ; G03F7/40 ; G03F7/038 ; C09D133/06 ; H01L21/3213 ; H01L21/308 ; C08L25/04 ; H01L21/027 ; G03F7/039 ; C09D133/04 ; C08L25/16

Abstract:
A composition includes two types of polymers each having a different weight average molecular weight. The two types of polymers are each a styrene polymer having a group which bonds to at least one end of a main chain and which includes at least one of a hydroxy group, a carboxy group, a sulfanyl group, an epoxy group, a cyano group, a vinyl group or a carbonyl group. A difference in weight average molecular weight between the two types of polymers is no less than 2,000 and no greater than 30,000.
Public/Granted literature
- US20190107777A1 PATTERN-FORMING METHOD AND COMPOSITION Public/Granted day:2019-04-11
Information query