Invention Grant
- Patent Title: High sensitivity repeater defect detection
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Application No.: US15804980Application Date: 2017-11-06
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Publication No.: US10395358B2Publication Date: 2019-08-27
- Inventor: Bjorn Brauer , Eugene Shifrin , Ashok Mathew , Chetana Bhaskar , Lisheng Gao , Santosh Bhattacharyya , Hucheng Lee , Benjamin Murray
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corp.
- Current Assignee: KLA-Tencor Corp.
- Current Assignee Address: US CA Milpitas
- Agent Ann Marie Mewherter
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G01N21/95

Abstract:
Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) that include one or more image processing components that acquire images generated by an inspection subsystem for a wafer, a main user interface component that provides information generated for the wafer and the reticle to a user and receives instructions from the user, and an interface component that provides an interface between the one or more image processing components and the main user interface. Unlike currently used systems, the one or more image processing components are configured for performing repeater defect detection by applying a repeater defect detection algorithm to the images acquired by the one or more image processing components, and the repeater defect detection algorithm is configured to detect defects on the wafer using a hot threshold and to identify the defects that are repeater defects.
Public/Granted literature
- US20180130199A1 HIGH SENSITIVITY REPEATER DEFECT DETECTION Public/Granted day:2018-05-10
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