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公开(公告)号：US20180276808A1
公开(公告)日：2018-09-27
申请号：US15858264
申请日：2017-12-29
Applicant: KLA-Tencor Corporation
Inventor： Bjorn Brauer , Benjamin Murray , Shishir Suman , Lisheng Gao
Abstract: Systems and methods of a two-pass inspection methodology that dynamically creates micro care areas for inspection of repeater defects. Micro care areas can be formed around each location of a repeater defect. After inspection, additional repeater defects in the micro care areas can be identified. Attributes of the repeater defects can be compared and any repeater defects with attributes that deviate from an expected group attribute distribution can be classified as nuisance.
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公开(公告)号：US10600175B2
公开(公告)日：2020-03-24
申请号：US15858264
申请日：2017-12-29
Applicant: KLA-Tencor Corporation
Inventor： Bjorn Brauer , Benjamin Murray , Shishir Suman , Lisheng Gao
Abstract: Systems and methods of a two-pass inspection methodology that dynamically creates micro care areas for inspection of repeater defects. Micro care areas can be formed around each location of a repeater defect. After inspection, additional repeater defects in the micro care areas can be identified. Attributes of the repeater defects can be compared and any repeater defects with attributes that deviate from an expected group attribute distribution can be classified as nuisance.
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公开(公告)号：US10395358B2
公开(公告)日：2019-08-27
申请号：US15804980
申请日：2017-11-06
Applicant: KLA-Tencor Corporation
Inventor： Bjorn Brauer , Eugene Shifrin , Ashok Mathew , Chetana Bhaskar , Lisheng Gao , Santosh Bhattacharyya , Hucheng Lee , Benjamin Murray
Abstract: Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) that include one or more image processing components that acquire images generated by an inspection subsystem for a wafer, a main user interface component that provides information generated for the wafer and the reticle to a user and receives instructions from the user, and an interface component that provides an interface between the one or more image processing components and the main user interface. Unlike currently used systems, the one or more image processing components are configured for performing repeater defect detection by applying a repeater defect detection algorithm to the images acquired by the one or more image processing components, and the repeater defect detection algorithm is configured to detect defects on the wafer using a hot threshold and to identify the defects that are repeater defects.
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公开(公告)号：US20180130199A1
公开(公告)日：2018-05-10
申请号：US15804980
申请日：2017-11-06
Applicant: KLA-Tencor Corporation
Inventor： Bjorn Brauer , Eugene Shifrin , Ashok Mathew , Chetana Bhaskar , Lisheng Gao , Santosh Bhattacharyya , Hucheng Lee , Benjamin Murray
CPC classification number: G06T7/0006 , G01N21/9501 , G01N2021/95676 , G05B19/41875 , G06T7/0004 , G06T7/001 , G06T2207/10061 , G06T2207/10152 , G06T2207/20076 , G06T2207/20224 , G06T2207/30148
Abstract: Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) that include one or more image processing components that acquire images generated by an inspection subsystem for a wafer, a main user interface component that provides information generated for the wafer and the reticle to a user and receives instructions from the user, and an interface component that provides an interface between the one or more image processing components and the main user interface. Unlike currently used systems, the one or more image processing components are configured for performing repeater defect detection by applying a repeater defect detection algorithm to the images acquired by the one or more image processing components, and the repeater defect detection algorithm is configured to detect defects on the wafer using a hot threshold and to identify the defects that are repeater defects.
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