- 专利标题: Plasma processing apparatus
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申请号: US15415403申请日: 2017-01-25
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公开(公告)号: US10395900B2公开(公告)日: 2019-08-27
- 发明人: Hak Young Kim , Jung Pyo Hong , Jong Woo Sun , Doug Yong Sung , Yong Ho Lim , Yun Kwang Jeon , Hwa Jun Jung
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel, P.A.
- 优先权: KR10-2016-0075871 20160617
- 主分类号: H01J37/32
- IPC分类号: H01J37/32 ; H01L21/67
摘要:
A plasma processing apparatus includes a chamber, a window plate disposed in an upper portion of the chamber and having a fastening hole defined therein, an injector having a body part including a plurality of nozzles and configured to be fastened to the fastening hole, and a flange part extending radially from the body part to partially cover a bottom surface of the window plate when the body part is fastened to the fastening hole, and a stopper configured to be fastened to the body part on an upper surface of the window plate to hold the injector in the fastening hole when the body part is fastened to the fastening hole.
公开/授权文献
- US20170365444A1 Plasma Processing Apparatus 公开/授权日:2017-12-21
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