Plasma processing apparatus
    1.
    发明授权

    公开(公告)号:US10395900B2

    公开(公告)日:2019-08-27

    申请号:US15415403

    申请日:2017-01-25

    IPC分类号: H01J37/32 H01L21/67

    摘要: A plasma processing apparatus includes a chamber, a window plate disposed in an upper portion of the chamber and having a fastening hole defined therein, an injector having a body part including a plurality of nozzles and configured to be fastened to the fastening hole, and a flange part extending radially from the body part to partially cover a bottom surface of the window plate when the body part is fastened to the fastening hole, and a stopper configured to be fastened to the body part on an upper surface of the window plate to hold the injector in the fastening hole when the body part is fastened to the fastening hole.

    Plasma processing apparatus
    3.
    发明授权

    公开(公告)号:US10903053B2

    公开(公告)日:2021-01-26

    申请号:US16549408

    申请日:2019-08-23

    IPC分类号: H01J37/32 H01L21/67

    摘要: A plasma processing apparatus includes a chamber, a window plate disposed in an upper portion of the chamber and having a fastening hole defined therein, an injector having a body part including a plurality of nozzles and configured to be fastened to the fastening hole, and a flange part extending radially from the body part to partially cover a bottom surface of the window plate when the body part is fastened to the fastening hole, and a stopper configured to be fastened to the body part on an upper surface of the window plate to hold the injector in the fastening hole when the body part is fastened to the fastening hole.