Invention Grant
- Patent Title: Photopatternable compositions, patterned high k thin film dielectrics and related devices
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Application No.: US15390708Application Date: 2016-12-26
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Publication No.: US10409159B2Publication Date: 2019-09-10
- Inventor: Wei Zhao , Antonio Facchetti , Yan Zheng , Andrea Stefani , Mauro Riva , Caterina Soldano , Michele Muccini
- Applicant: Flexterra, Inc.
- Applicant Address: US IL Skokie
- Assignee: Flexterra, Inc.
- Current Assignee: Flexterra, Inc.
- Current Assignee Address: US IL Skokie
- Agency: McDonnell Boehnen Hulbert & Berghoff LLP
- Priority: EP14425084 20140626
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/004 ; C08F214/22 ; H01L51/52 ; H01L51/00 ; C09D127/16 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/38 ; H01L51/05
Abstract:
The present teachings relate to a photopatternable composition including a vinylidene fluoride-based polymer, a photosensitive non-nucleophilic base, and a crosslinking agent. The photopatternable composition can be used to prepare a patterned thin film component for use in an electronic, optical, or optoelectronic device such as an organic thin film transistor. The patterned thin film component can be used as a gate dielectric with a high dielectric constant, for example, a dielectric constant greater than 10.
Public/Granted literature
- US20170192354A1 PHOTOPATTERNABLE COMPOSITIONS, PATTERNED HIGH K THIN FILM DIELECTRICS AND RELATED DEVICES Public/Granted day:2017-07-06
Information query
IPC分类:
