公开(公告)号：US10551745B2

公开(公告)日：2020-02-04

申请号：US15495928

申请日：2017-04-24

Applicant: Flexterra, Inc.

Inventor： Yan Zheng ,  Yan Hu ,  Wei Zhao ,  Antonio Facchetti

IPC: G03F7/40 ,  G03F7/075 ,  G03F7/038 ,  G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/42 ,  H01L21/02 ,  H01L29/786 ,  H01L51/05

Abstract: The present teachings relate to compositions for forming a negative-tone photopatternable dielectric material, where the compositions include, among other components, an organic filler and one or more photoactive compounds, and where the presence of the organic filler enables the effective removal of such photoactive compounds (after curing, and during or after the development step) which, if allowed to remain in the photopatterned dielectric material, would lead to deleterious effects on its dielectric properties.

公开(公告)号：US10409159B2

公开(公告)日：2019-09-10

申请号：US15390708

申请日：2016-12-26

Applicant: Flexterra, Inc.

Inventor： Wei Zhao ,  Antonio Facchetti ,  Yan Zheng ,  Andrea Stefani ,  Mauro Riva ,  Caterina Soldano ,  Michele Muccini

IPC: G03F7/038 ,  G03F7/004 ,  C08F214/22 ,  H01L51/52 ,  H01L51/00 ,  C09D127/16 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  H01L51/05

Abstract: The present teachings relate to a photopatternable composition including a vinylidene fluoride-based polymer, a photosensitive non-nucleophilic base, and a crosslinking agent. The photopatternable composition can be used to prepare a patterned thin film component for use in an electronic, optical, or optoelectronic device such as an organic thin film transistor. The patterned thin film component can be used as a gate dielectric with a high dielectric constant, for example, a dielectric constant greater than 10.

公开(公告)号：US20170192354A1

公开(公告)日：2017-07-06

申请号：US15390708

申请日：2016-12-26

Applicant: Flexterra, Inc. ,  E.T.C. S.R.L.

Inventor： Wei Zhao ,  Antonio Facchetti ,  Yan Zheng ,  Andrea Stefani ,  Mauro Riva ,  Caterina Soldano ,  Michele Muccini

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/038 ,  G03F7/32 ,  H01L51/00 ,  G03F7/16 ,  G03F7/38

CPC classification number: G03F7/0045 ,  C08F214/222 ,  C09D127/16 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0384 ,  G03F7/162 ,  G03F7/2002 ,  G03F7/32 ,  G03F7/38 ,  H01L51/004 ,  H01L51/052 ,  H01L51/0541 ,  H01L51/0545 ,  H01L51/5296 ,  C08K5/18 ,  C08K5/3437 ,  C08L83/08 ,  C08K5/0025

Abstract: The present teachings relate to a photopatternable composition including a vinylidene fluoride-based polymer, a photosensitive non-nucleophilic base, and a crosslinking agent. The photopatternable composition can be used to prepare a patterned thin film component for use in an electronic, optical, or optoelectronic device such as an organic thin film transistor. The patterned thin film component can be used as a gate dielectric with a high dielectric constant, for example, a dielectric constant greater than 10.

公开(公告)号：US20170227846A1

公开(公告)日：2017-08-10

申请号：US15495928

申请日：2017-04-24

Applicant: Flexterra, Inc.

Inventor： Yan Zheng ,  Yan Hu ,  Wei Zhao ,  Antonio Facchetti

IPC: G03F7/038 ,  H01L21/02 ,  G03F7/16 ,  G03F7/42 ,  G03F7/20 ,  G03F7/32 ,  G03F7/075 ,  G03F7/40 ,  G03F7/004

Abstract: The present teachings relate to compositions for forming a negative-tone photopatternable dielectric material, where the compositions include, among other components, an organic filler and one or more photoactive compounds, and where the presence of the organic filler enables the effective removal of such photoactive compounds (after curing, and during or after the development step) which, if allowed to remain in the photopatterned dielectric material, would lead to deleterious effects on its dielectric properties.

公开(公告)号：US09929345B1

公开(公告)日：2018-03-27

申请号：US15250918

申请日：2016-08-30

Applicant: Flexterra, Inc.

Inventor： Shaofeng Lu ,  Damien Boudinet ,  Yuqing Xia ,  Wei Zhao ,  Antonio Facchetti

IPC: H01L21/02 ,  H01L21/445 ,  H01L51/05 ,  H01L51/00 ,  H01L51/10 ,  H01L29/786 ,  H01L29/49 ,  H01L23/29 ,  H01L23/31

CPC classification number: H01L51/0034 ,  C08G61/08 ,  C08G2261/135 ,  C08G2261/3325 ,  C08G2261/418 ,  C08G2261/65 ,  C08G2261/72 ,  C08G2261/76 ,  H01L21/02118 ,  H01L21/02282 ,  H01L21/445 ,  H01L23/293 ,  H01L23/3178 ,  H01L29/4908 ,  H01L29/7869 ,  H01L51/0035 ,  H01L51/052 ,  H01L51/0529 ,  H01L51/0558 ,  H01L51/107

Abstract: Disclosed are curable linear polymers that can be used as active and/or passive organic materials in various electronic, optical, and optoelectronic devices. In some embodiments, the device can include an organic semiconductor layer and a dielectric layer prepared from such curable linear polymers. In some embodiments, the device can include a passivation layer prepared from the linear polymers described herein. The present linear polymers can be solution-processed, then cured thermally (particularly, at relatively low temperatures) and/or photochemically into various thin film materials with desirable properties.