- Patent Title: Water soluble photosensitive resin composition and film using same
-
Application No.: US15691282Application Date: 2017-08-30
-
Publication No.: US10423069B2Publication Date: 2019-09-24
- Inventor: Chen-Feng Yen , Chang-Hung Lee , Yi-Fang Lin , Yen-Chin Hsiao , Shou-Jui Hsiang , Mao-Feng Hsu
- Applicant: Zhen Ding Technology Co., Ltd.
- Applicant Address: TW Tayuan, Taoyuan
- Assignee: Zhen Ding Technology Co., Ltd.
- Current Assignee: Zhen Ding Technology Co., Ltd.
- Current Assignee Address: TW Tayuan, Taoyuan
- Agency: ScienBiziP, P.C.
- Priority: TW105144074 20161230
- Main IPC: G03F7/029
- IPC: G03F7/029 ; H05K1/03 ; C09D139/04 ; C07D263/12 ; C07D263/14 ; C09D133/06 ; G03F7/031 ; G03F7/038 ; G03F7/07 ; H05K3/28 ; H05K3/34

Abstract:
A non-toxic water soluble photosensitive resin composition able to function as a solder mask coating comprises a polymer containing oxazolinyl, a photosensitive monomer, and a photo-initiator. These elements are all water soluble or water dispersible. The polymer containing oxazolinyl and the photosensitive monomer have a plurality of carbon-carbon double bonds. The polymer containing oxazolinyl and the photosensitive monomer are polymerized to form a dense cross-linking network structure when the water soluble photosensitive resin composition is exposed to ultraviolet radiation. A film using the water soluble photosensitive resin composition is also provided.
Public/Granted literature
- US20180188649A1 WATER SOLUBLE PHOTOSENSITIVE RESIN COMPOSITION AND FILM USING SAME Public/Granted day:2018-07-05
Information query
IPC分类: