Invention Grant
- Patent Title: Polysilicon chip reclamation assembly and method of reclaiming polysilicon chips from a polysilicon cleaning apparatus
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Application No.: US15506483Application Date: 2015-09-03
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Publication No.: US10431447B2Publication Date: 2019-10-01
- Inventor: Jason L. Giardina , James C. Mundell , Nathaniel C. McIntee-Chmielewski
- Applicant: Hemlock Semiconductor Corporation
- Applicant Address: US MI Hemlock
- Assignee: HEMLOCK SEMICONDUCTOR CORPORATION
- Current Assignee: HEMLOCK SEMICONDUCTOR CORPORATION
- Current Assignee Address: US MI Hemlock
- Agency: Cantor Colburn LLP
- International Application: PCT/US2015/048293 WO 20150903
- International Announcement: WO2016/053571 WO 20160407
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L23/48 ; H01L21/67 ; H01L21/677 ; B08B3/08 ; B08B3/14 ; C30B29/06 ; C30B35/00

Abstract:
A polysilicon chip reclamation assembly includes a polysilicon cleaning apparatus configured to clean a plurality of bodies of polysilicon. Also included is a plurality of polysilicon chips generated from the bodies of polysilicon during cleaning thereof, wherein each of the plurality of polysilicon chips has a longest dimensional length ranging from 0.1 mm to 25.0 mm. Further included is a polysilicon apparatus drain line configured to route the plurality of polysilicon chips from the polysilicon cleaning apparatus to a main chip drain line, wherein the main chip drain line is oriented at a downward slope away from the polysilicon apparatus drain line. Yet further included is a fluid source fluidly coupled to the main chip drain line and configured to inject a fluid into the main chip drain line to drive the plurality of polysilicon chips through the main chip drain line.
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