- 专利标题: X-ray diffractometer with multilayer reflection-type monochromator
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申请号: US15312881申请日: 2015-01-14
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公开(公告)号: US10436723B2公开(公告)日: 2019-10-08
- 发明人: Takeshi Osakabe , Tetsuya Ozawa , Kazuhiko Omote , Licai Jiang , Boris Verman , Yuriy Platonov
- 申请人: RIGAKU CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: RIGAKU CORPORATION
- 当前专利权人: RIGAKU CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP
- 优先权: JP2014-116488 20140605
- 国际申请: PCT/JP2015/050717 WO 20150114
- 国际公布: WO2015/186369 WO 20151210
- 主分类号: G01N23/20008
- IPC分类号: G01N23/20008 ; G21K1/04 ; G21K1/06 ; G02B7/00 ; G02B27/42 ; G02B27/09 ; G01N23/207
摘要:
Only X-rays having a specific wavelength, selected from a group of focusing X-rays diffracted from a sample, are reflected from a monochromator based on a Bragg's condition, passed through a receiving slit and detected by an X-ray detector. The monochromator is configured to be freely removable, and arranged between the sample and a focal point at which the wavelength-selected focusing X-rays diffracted from the sample are directly focused. At this time, the monochromator is moved so as to position the monochromator as close to the focal point as possible. The monochromator comprises a multilayer mirror having an internal interplanar spacing, wherein said internal interplanar spacing varies continuously from one end of the monochromator to the other end.
公开/授权文献
- US20170191950A1 X-RAY DIFFRACTOMETER 公开/授权日:2017-07-06
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