公开(公告)号：US20190272929A1

公开(公告)日：2019-09-05

申请号：US16284777

申请日：2019-02-25

申请人： Rigaku Corporation

发明人： Kazuhiko Omote ,  Takeshi Osakabe ,  Tetsuya Ozawa ,  Licai Jiang ,  Boris Verman

IPC分类号： G21K1/06 ,  G21K1/02 ,  G01N23/201

摘要： An X-ray generator includes: a line X-ray source; a multilayer film mirror; and a side-by-side reflecting mirror including two concave mirrors joined together so as to share a join line. A cross section of a reflecting surface of the multilayer film mirror has a parabolic shape, and a focus of the parabolic shape is located at the line X-ray source. Cross sections of reflecting surfaces of the two concave mirrors of the side-by-side reflecting mirror each have a parabolic shape, and each of focuses of the parabolic shapes is located on a side opposite to the multilayer film mirror. An extended line of the join line of the side-by-side reflecting mirror passes through the multilayer film mirror and the line X-ray source as viewed in a plan view.

公开(公告)号：US10436723B2

公开(公告)日：2019-10-08

申请号：US15312881

申请日：2015-01-14

申请人： RIGAKU CORPORATION

发明人： Takeshi Osakabe ,  Tetsuya Ozawa ,  Kazuhiko Omote ,  Licai Jiang ,  Boris Verman ,  Yuriy Platonov

IPC分类号： G01N23/20008 ,  G21K1/04 ,  G21K1/06 ,  G02B7/00 ,  G02B27/42 ,  G02B27/09 ,  G01N23/207

摘要： Only X-rays having a specific wavelength, selected from a group of focusing X-rays diffracted from a sample, are reflected from a monochromator based on a Bragg's condition, passed through a receiving slit and detected by an X-ray detector. The monochromator is configured to be freely removable, and arranged between the sample and a focal point at which the wavelength-selected focusing X-rays diffracted from the sample are directly focused. At this time, the monochromator is moved so as to position the monochromator as close to the focal point as possible. The monochromator comprises a multilayer mirror having an internal interplanar spacing, wherein said internal interplanar spacing varies continuously from one end of the monochromator to the other end.

公开(公告)号：US10854348B2

公开(公告)日：2020-12-01

申请号：US16284777

申请日：2019-02-25

申请人： Rigaku Corporation

发明人： Kazuhiko Omote ,  Takeshi Osakabe ,  Tetsuya Ozawa ,  Licai Jiang ,  Boris Verman

IPC分类号： G21K1/00 ,  G21K1/06 ,  G01N23/201 ,  G21K1/02 ,  H05G1/02

摘要： An X-ray generator includes: a line X-ray source; a multilayer film mirror; and a side-by-side reflecting mirror including two concave mirrors joined together so as to share a join line. A cross section of a reflecting surface of the multilayer film mirror has a parabolic shape, and a focus of the parabolic shape is located at the line X-ray source. Cross sections of reflecting surfaces of the two concave mirrors of the side-by-side reflecting mirror each have a parabolic shape, and each of focuses of the parabolic shapes is located on a side opposite to the multilayer film mirror. An extended line of the join line of the side-by-side reflecting mirror passes through the multilayer film mirror and the line X-ray source as viewed in a plan view.

公开(公告)号：US11867646B2

公开(公告)日：2024-01-09

申请号：US18034886

申请日：2021-11-01

申请人： Rigaku Corporation

发明人： Makoto Kambe ,  Kazuhiko Omote ,  Toshifumi Higuchi ,  Tsutomu Tada ,  Hajime Fujimura ,  Masahiro Nonoguchi ,  Licai Jiang ,  Boris Verman ,  Yuriy Platonov

IPC分类号： G01N23/223

CPC分类号： G01N23/223

摘要： Provided is a total reflection X-ray fluorescence spectrometer which has high analysis sensitivity and analysis speed. The total reflection X-ray fluorescence spectrometer includes: an X-ray source that has an electron beam focal point having an effective width in a direction parallel to a surface of a sample, and orthogonal to an X-ray irradiation direction, that is larger than a dimension in the irradiation direction; a reflective optic that has an effective width in the orthogonal direction that is larger than that of the electron beam focal point, and has a curved surface in the irradiation direction; and a plurality of detectors that are arranged in a row in the orthogonal direction, and are configured to measure intensities of fluorescent X-rays emitted from the sample irradiated with primary X-rays focused by the reflective optic.

公开(公告)号：US20190227005A1

公开(公告)日：2019-07-25

申请号：US16205801

申请日：2017-07-12

申请人： Rigaku Corporation

发明人： Kiyoshi Ogata ,  Kazuhiko Omote ,  Sei Yoshihara ,  Yoshiyasu Ito ,  Hiroshi Motono ,  Hideaki Takahashi ,  Takao Kinefuchi ,  Akifusa Higuchi ,  Shiro Umegaki ,  Shigematsu Asano ,  Ryotaro Yamaguchi ,  Katsutaka Horada ,  Makoto Kambe ,  Licai Jiang ,  Boris Verman

IPC分类号： G01N23/20016 ,  G01B15/02 ,  G21K1/06 ,  G01N23/207 ,  G01N23/20025

摘要： In an X-ray inspection device according to the present invention, an X-ray irradiation unit 40 includes a first X-ray optical element 42 for focusing characteristic X-rays in a vertical direction, and a second X-ray optical element 43 for focusing the characteristic X-rays in a horizontal direction. The first X-ray optical element 42 is constituted by a crystal material having high crystallinity. The second X-ray optical element includes a multilayer mirror.