- 专利标题: Three-dimensional memory device with gated contact via structures and method of making thereof
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申请号: US15717102申请日: 2017-09-27
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公开(公告)号: US10453798B2公开(公告)日: 2019-10-22
- 发明人: Masanori Tsutsumi , Naohiro Hosoda
- 申请人: SANDISK TECHNOLOGIES LLC
- 申请人地址: US TX Addison
- 专利权人: SANDISK TECHNOLOGIES LLC
- 当前专利权人: SANDISK TECHNOLOGIES LLC
- 当前专利权人地址: US TX Addison
- 代理机构: The Marbury Law Group PLLC
- 主分类号: H01L23/535
- IPC分类号: H01L23/535 ; H01L21/768 ; H01L27/11582 ; H01L27/11556 ; H01L27/11565 ; H01L27/1157 ; H01L27/11575
摘要:
A three-dimensional memory device includes laterally spaced apart vertically alternating stacks of insulating strips and word line electrically conductive strips located over a substrate, memory stack structures extending through the multiple vertically alternating stacks, word line contact via structures contacting a top surface of the respective word line electrically conductive strips, field effect transistors overlying the word line contact via structures, and connector line structures which are electrically connected to respective subsets of the word line electrically conductive strips in different vertically alternating stacks through the field effect transistors.
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