Invention Grant
- Patent Title: Polarization measurements of metrology targets and corresponding target designs
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Application No.: US14949444Application Date: 2015-11-23
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Publication No.: US10458777B2Publication Date: 2019-10-29
- Inventor: Eran Amit , Barry Loevsky , Andrew Hill , Amnon Manassen , Nuriel Amir , Vladimir Levinski , Roie Volkovich
- Applicant: KLA-TENCOR CORPORATION
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G01B11/06
- IPC: G01B11/06 ; G01B11/27 ; G01N21/95 ; G01N21/956 ; G06F17/50 ; H01L21/66 ; G01N21/88

Abstract:
Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.
Public/Granted literature
- US20160178351A1 POLARIZATION MEASUREMENTS OF METROLOGY TARGETS AND CORRESPONDING TARGET DESIGNS Public/Granted day:2016-06-23
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