Invention Grant
- Patent Title: Sulfonyl photoacid generators and photoresists comprising same
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Application No.: US15332340Application Date: 2016-10-24
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Publication No.: US10466588B2Publication Date: 2019-11-05
- Inventor: Cong Liu , Cheng-Bai Xu
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; C07C309/17 ; C07C311/48 ; C07C381/12 ; G03F7/038 ; G03F7/039 ; C07C313/04 ; C07C321/28 ; G03F7/16 ; G03F7/20 ; G03F7/32
Abstract:
New bis(sulfonyl)imide and tri(sulfonyl)methide photoacid generator compounds (“PAGs”) are provided as well as photoresist compositions that comprise such PAG compounds.
Public/Granted literature
- US20170153542A1 SULFONYL PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME Public/Granted day:2017-06-01
Information query
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