Invention Grant
- Patent Title: Simplified double magnetic tunnel junctions
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Application No.: US15096864Application Date: 2016-04-12
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Publication No.: US10468455B2Publication Date: 2019-11-05
- Inventor: Guohan Hu , Younghyun Kim , Jeong-Heon Park , Daniel Worledge
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION , SAMSUNG ELECTRONICS, CO., LTD.
- Applicant Address: US NY Armonk KR Gyeonggi-Do
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION,SAMSUNG ELECTRONICS, CO., LTD.
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION,SAMSUNG ELECTRONICS, CO., LTD.
- Current Assignee Address: US NY Armonk KR Gyeonggi-Do
- Agency: Tutunjian & Bitetto, P.C.
- Agent Vazken Alexanian
- Main IPC: G11C11/16
- IPC: G11C11/16 ; H01L27/22 ; H01L43/02 ; H01L43/08 ; H01L43/10 ; H01L43/12

Abstract:
Double magnetic tunnel junctions and methods of forming the same include a bottom reference layer having a first fixed magnetization and a first thickness. A first tunnel barrier is formed on the bottom reference layer. A free layer is formed on the first tunnel barrier and has a changeable magnetization. A second tunnel barrier is formed on the free layer. A top reference layer is formed on the second tunnel barrier and has a second fixed magnetization that is opposite to the first fixed magnetization and a second thickness that is significantly smaller than the first thickness.
Public/Granted literature
- US20170294482A1 SIMPLIFIED DOUBLE MAGNETIC TUNNEL JUNCTIONS Public/Granted day:2017-10-12
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