Invention Grant
- Patent Title: Carrier ring wall for reduction of back-diffusion of reactive species and suppression of local parasitic plasma ignition
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Application No.: US15080961Application Date: 2016-03-25
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Publication No.: US10475627B2Publication Date: 2019-11-12
- Inventor: Chengzhu Qi , Yukinori Sakiyama , Bin Luo , Douglas Keil , Pramod Subramonium , Chunhai Ji , Joseph Lindsey Womack
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Penilla IP, APC
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/02 ; C23C16/50 ; C23C16/458 ; H01L21/67 ; H01L21/687
Abstract:
A carrier ring configured to support a substrate during transport to or from a pedestal of a process tool and surrounding the substrate during processing is defined by, an inner annular portion having a first thickness, the inner annular portion defined to be adjacent a substrate support region of the pedestal; a middle annular portion surrounding the inner annular portion, the middle annular portion having a second thickness greater than the first thickness, such that a transition from a top surface of the inner annular portion to a top surface of the middle annular portion defines a first step; an outer annular portion surrounding the middle annular portion, the outer annular portion having a third thickness greater than the second thickness, such that a transition from the top surface of the middle annular portion to a top surface of the outer annular portion defines a second step.
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