Invention Grant
- Patent Title: Optical proximity correction method and system
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Application No.: US15756799Application Date: 2016-05-11
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Publication No.: US10521546B2Publication Date: 2019-12-31
- Inventor: Jinyin Wan , Jinheng Wang , Lei Zhang , Jie Chen
- Applicant: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Applicant Address: CN Wuzi New District
- Assignee: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Current Assignee: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Current Assignee Address: CN Wuzi New District
- Agency: Kagan Binder, PLLC
- Priority: CN201510558089 20150902
- International Application: PCT/CN2016/081701 WO 20160511
- International Announcement: WO2017/036173 WO 20170309
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/00 ; G03F7/00 ; G03F7/20 ; G03F1/36

Abstract:
An optical proximity correction method, comprising: dissecting an edge of a design pattern (120/220) to form a segment (Seg1/Seg2); setting target points of the segments (Seg1/Seg2), and if the segments (Seg1/Seg2) translate in a direction vertical to the segments (Seg1/Seg2), controlling tangent points (P1/P2) of the segments (Seg1/Seg2) tangent to a simulated pattern (110/210) to coincide with the target points; computing edge position differences of the target points; and correcting the design pattern (120/220) according to the edge position differences.
Public/Granted literature
- US20180252996A1 OPTICAL PROXIMITY CORRECTION METHOD AND SYSTEM Public/Granted day:2018-09-06
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